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Kemesys manufactures slurries for CMP, distributes pads, conditioners, brushes and offers its world reknown expertise for polishing processes.
December 4, 2006: Based on its formulation capabilities and experience of the silicon polishing, KEMESYS is developing a silicon etchant optimized to enhance the cell yield of photovoltaic sensors.
The Solar industry is developing very fast in many European countries. The photovoltaic sensors are manufatcured on square Poly-Silicon substrates. |
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Differently from the semiconductor manufacturing where the Silicon wafers require highly polished surface, this technology is looking for a flat but non reflective surface state.
The KEMESYS' silicon etchant is currently under evaluation at one of the European market leader of this promising industry.
Samples are available on request.
November 8, 2006: The KEMPAK has been recently completed by the high performance filters range of our partner Graver Technologies!
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Graver Technologies is a member of the Marmon Group, an international group with sales exceeding $6 billion. The core competencies of Graver include the development and the manufacturing of separation, filtration and purification of fluids, process water and gases products. |
Besides products for beverage or pharmaceutical industries, Graver has developed a special product line for Semiconductor Applications qualified by a numerous Microelectronic manufacturers worldwide.
Since November 2006, KEMESYS is the official Distributor of Graver Filters for the European Semiconductor Market.
Don't hesitate to contact us for more information about the products for your applications!
September 11, 2006: KEMESYS will attend the 2006 International Conference on Planarization/CMP Technology held on October 12-13, 2006 in Foster City, CA.
On Thursday, October 12, at 9.40 a.m., Bernard Laborie will give the presentation “Development of a Custom-Designed Copper Slurry for the Fabrication of a RF-MEMS Device” co-authored with Gerfried Zwicker, Director of the Fraunhofer Institute for Silicon Technology ISIT (Germany) and Chairman of the German CMP User Group (GCMPUG).
This successful common development does illustrate how KEMESYS has developed a methodology enabling slurry formulation optimization in a fast and efficient manner.
During the two Conference days, KEMESYS will welcome you as well at our booth.
The full presentation is available upon request !.
June 20, 2006: KEMESYS is now representing DOOSAN DND, the CMP division of DOOSAN Group. DOOSAN Group is the 9th largest Cheabol and the oldest Korean Company (founded in the 19th century). The turnover is exceeding USD 15 Billions.
DOOSAN DND manufactures CMP equipments for oxide, tungsten, copper... for 200mm and 300 mm wafers, as well as stand alone cleaners (fully integrated or retrofitable units). In cooperation with the four major Korean Universities, DOOSAN has developed a new polisher concept.
Based on high Process and Hardware reliability, high throughput and low cost of ownership make DOOSAN CMP tools perfectly suited for high volume production. The two major Korean IC Makers have been using them in production for several years. Contact us for more information !
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| DOOSAN UNIPLA 231 CMP System |
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May 15, 2006: KEMESYS is receiving an increasing number of requests for technical services. We distinguish three major needs:
• On demand analysis of chemicals, slurries and other CMP materials
• CMP / Polishing process expertise
• Specialties chemicals engineering
This service offering is detailed in a presentation available for our customers and partners. The full presentation is available upon request !
April 28, 2006: KEMESYS has completed the development of a Copper slurry for a major German research institute for MEMS applications. The first purchase order was received for this high removal rate, repeatable bulk Copper slurry. This initial success is opening the way to more MEMS specific developments. Contact us for more information !
April 4-7, 2006: This year again, KEMESYS exhibited at Semicon Europa in Munich in Hall A2, jointly on the JEMI booth. This week was very rich in interesting contacts and sales opportunities. Friday, April the 7th, at the International CMP User Meeting following the exhibition, Bernard Laborie introduced a paper about the 2nd generation of Ceria Slurry for ILD. The full paper is available upon request!
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| Claudia Starke and Thierry Lefebvre are helping the many visitors on KEMESYS booth. |
February 21-23, 2006: Kemesys attended the 11th International CMP Planarization for ULSI Multilevel Interconnection Conference held on February 21-23, 2006 in Fremont, CA. Together with Ara Philipossian from ARACA, Bernard Laborie introduced the poster "Frictional, Thermal and Kinetic Characterization of a Novel Ceria Based Abrasive Slurry for Silicon Dioxide CMP". The full paper is available upon request!
November 17-19, 2005: Kemesys has presented a poster at the CMP User Meeting Korea 2005. This poster is titled "Experimental and numerical analysis of a novel Ceria based abrasive slurry for Silicon Dioxide CMP" and is co-authoured by the University of Arizona and ARACA Inc. Documents are available upon request
November, 2005: Kemesys has completed the filing of its Ceria slurry. High Removal Rate, high planarization efficiency and excellent polishing uniformity are the major benefits of the Kemesys innovative formulation (patented). A Pre Metal Dielectric (PMD) application project is currently on going with an European Fab.
September 12-14, 2005: SEMICON Taiwan was held in the Taipei World Trade Center. Exhibitors from 600+ companies displayed products for 20,000+ visitors. Kemesys participated to the event on KROMAX booth, its distributor in Taiwan, Singapore and Malaysia.
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On the left: Ethan Yao (KROMAX) and Bernard Laborie (KEMESYS). |
September 1st, 2005: AELLO and KEMESYS entered into a distribution agreement for solid concentration and particles size monitoring systems for slurries.
July/August, 2005: A second generation Ceria slurry for high planarization ILD (Inter Level Dielectric) has been developed by Kemesys. The main process result is to planarize a very high aspect ratio topography with a minimum oxide layer removal.
May 25-29, 2005: An European distributorship agreement was signed between GANA CLEANER and Kemesys. Established in 1998, GANA CLEANER is a specialist of PVA molded parts such as PVA brushes which are mostly used in Post CMP cleaning applications.
April 12-14, 2005: This year again, Kemesys exhibited at SEMICON Europa. We joined 12 other JEMI members (Joint Equipment Manufacturers Initiative) to co-exhibit on a 160m2 booth. A presentation of Kemesys slurry customization approach was given at the CMP User Meeting. The Meetings are organised by the German VDE/VDI-GMM Society for Microelectronics, Micro and Precision Engineering together with the Fraunhofer Institute for Silicon Technology ISIT.
January, 2005: Kemesys is certified ISO 9001 version 2000. MOODY's Certification France ran the audit and checked that Kemesys procedures are conforming to the standards. See the certificat
November, 2004: ACE HIGHTECH and Kemesys entered into a partnership agreement including the distribution of ACE HIGHTECH products in Europe. ACE HIGHTECH is a Korean slurry manufacturer specialized in precipitated (colloidal) silica slurry for Silicon and Silicon dioxyde layers.
September 13-15, 2004: Kemesys participate to SEMICON Taiwan 2004 with KROMAX, our distributor for Taiwan, Singapore and Malaysia.
September, 2004: The Kemesys CMP "Consumables Improvement Program" combines the applications lab cabability and an effective Design of Experiment technique. It offers to our customers an accelerated but low risk approach to improve their process performance. Full document available on request
July 18, 2004: Kemesys applies for a patent for its Tungsten slurry. This patent is based on an innovative formulation different from the existing standard solutions.
May 5, 2004: Our partner, the Microelectronics Materials group at Mallinckrodt Baker launches its new J.T.Baker Microelectronic Materials website. Visit the site
April 16, 2004: Would you like to know more about the turn-key solution for CMP ? Come and see the Kempak on Kemesys booth (B3 268) at SEMICON Europa 2004
February 26, 2004: Kemesys and KROMAX sign a distributor agreement covering Taiwan, Singapore and Malaysia... More (pdf)
October 28, 2003: Kemesys has entered into agreement with JT Baker to distribute post CMP cleaners and other high purity chemicals. This agreement is one more step to complete the full offering of CMP consumables: the KEMPAK.
Jul. 15th, 2003: Kemesys team is proud to announce that we now distribute for Shinhan Diamonds conditioners, thus offering complementary CMP products to our customers.
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